Granted Patent
Utility
US 6,180,293 · App. 09/340,148
Mask pattern preparing method and photomask
Inventors:
Satoshi Tanaka, Toshiya Kotani, Soichi Inoue
Patented Case
View Patent ↗
Granted: Jan 30, 2001
Filed: Jun 28, 1999
Inventors
Satoshi Tanaka
Toshiya Kotani
Soichi Inoue
Assignee (at issue)
Kabushiki Kaisha Toshiba
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.