IP Library Granted Patent US 6,186,316
Granted Patent Utility
US 6,186,316 · App. 09/331,099

Method and device for the precise electrolytic deposition and etching of metal layers on circuit boards and conductors foils in continuous systems

Inventor: Jacques Denis
Patented Case View Patent ↗
Granted: Feb 13, 2001 Filed: Jun 16, 1999
Inventor
Jacques Denis
Assignee (at issue)
Atotech Deutschland GmbH

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Quick Facts
Patent No.
US 6,186,316
App. No.
09/331,099
Filed
1999-06-16
Granted
2001-02-13
Kind
A