Granted Patent
Utility
US 6,187,092 · App. 09/033,642
Method and apparatus for controlling the thickness of a gate oxide in a semiconductor manufacturing process
Inventor:
Donald L. Wollesen
Patented Case
View Patent ↗
Granted: Feb 13, 2001
Filed: Mar 3, 1998
Inventor
Donald L. Wollesen
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.