Granted Patent
Utility
US 6,187,640 · App. 09/193,252
Semiconductor device manufacturing method including various oxidation steps with different concentration of chlorine to form a field oxide
Inventors:
Hiroyuki Shimada, Masaaki Higashitani, Hideo Kurihara, Hideki Komori, Satoshi Takahashi
Patented Case
View Patent ↗
Granted: Feb 13, 2001
Filed: Nov 17, 1998
Inventors
Hiroyuki Shimada
Masaaki Higashitani
Hideo Kurihara
Hideki Komori
Satoshi Takahashi
Assignees (at issue)
Fujitsu Limited
Advanced Micro Devices, Inc.
Fujitsu AMD Semiconductor Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.