Granted Patent
Utility
US 6,189,546 · App. 09/473,669
Polishing process for manufacturing dopant-striation-free polished silicon wafers
Inventors:
David Zhang, Sharon Brumer, Henry F. Erk
Patented Case
View Patent ↗
Granted: Feb 20, 2001
Filed: Dec 29, 1999
Inventors
David Zhang
Sharon Brumer
Henry F. Erk
Assignee (at issue)
MEMC Electronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.