Granted Patent
Utility
US 6,194,366 · App. 09/440,917
Post chemical-mechanical planarization (CMP) cleaning composition
Inventors:
Shahriar Naghshineh, Jeff Barnes, Yassaman Hashemi, Ewa Oldak
Patented Case
View Patent ↗
Granted: Feb 27, 2001
Filed: Nov 16, 1999
Inventors
Shahriar Naghshineh
Jeff Barnes
Yassaman Hashemi
Ewa Oldak
Assignee (at issue)
ESC Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.