Granted Patent
Utility
US 6,200,196 · App. 09/298,312
Polishing systems, methods of polishing substrates, and methods of preparing liquids for semiconductor fabrication processes
Inventors:
Dan Custer, Aaron Trent Ward, Shawn M. Lewis
Patented Case
View Patent ↗
Granted: Mar 13, 2001
Filed: Apr 22, 1999
Inventors
Dan Custer
Aaron Trent Ward
Shawn M. Lewis
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.