Granted Patent
Utility
US 6,232,196 · App. 09/264,167
Method of depositing silicon with high step coverage
Inventors:
Ivo Raaijmakers, Christopher François Lilian Pomarede, Cornelius Alexander van der Jengd, Alexander Gschwandtner, Andreas Grassl
Patented Case
View Patent ↗
Granted: May 15, 2001
Filed: Mar 5, 1999
Inventors
Ivo Raaijmakers
Christopher François Lilian Pomarede
Cornelius Alexander van der Jengd
Alexander Gschwandtner
Andreas Grassl
Assignee (at issue)
ASM America, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.