Granted Patent
Utility
US 6,232,244 · App. 09/562,442
Methodology for achieving dual gate oxide thicknesses
Inventor:
Effiong Ibok
Patented Case
View Patent ↗
Granted: May 15, 2001
Filed: May 1, 2000
Inventor
Effiong Ibok
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.