Granted Patent
Utility
US 6,232,417 · App. 08/928,573
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
Inventors:
Larry F. Rhodes, Andrew Bell, Saikumar Jayaraman, John-Henry Lipian, Brian L. Goodall, Robert A. Shick
Patented Case
View Patent ↗
Granted: May 15, 2001
Filed: Sep 12, 1997
Inventors
Larry F. Rhodes
Andrew Bell
Saikumar Jayaraman
John-Henry Lipian
Brian L. Goodall
Robert A. Shick
Assignee (at issue)
B. F. Goodrich Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.