Granted Patent
Utility
US 6,245,155 · App. 09/055,630
Method for removing photoresist and plasma etch residues
Inventors:
Vincent Leon, Kenji Honda, Eugene F. Rothgery
Patented Case
View Patent ↗
Granted: Jun 12, 2001
Filed: Apr 6, 1998
Inventors
Vincent Leon
Kenji Honda
Eugene F. Rothgery
Assignee (at issue)
Arch Specialty Chemicals, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.