Granted Patent
Utility
US 6,255,035 · App. 09/270,535
Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices
Inventors:
Jason P. Minter, John R. Lee
Patented Case
View Patent ↗
Granted: Jul 3, 2001
Filed: Mar 17, 1999
Inventors
Jason P. Minter
John R. Lee
Assignee (at issue)
Electron Vision Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.