Granted Patent
Utility
US 6,258,513 · App. 09/577,367
Photomask and pattern forming method employing the same
Inventors:
Norio Hasegawa, Fumio Murai, Katsuya Hayano
Patented Case
View Patent ↗
Granted: Jul 10, 2001
Filed: May 23, 2000
Inventors
Norio Hasegawa
Fumio Murai
Katsuya Hayano
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.