IP Library Granted Patent US 6,265,779
Granted Patent Utility
US 6,265,779 · App. 09/132,608

Method and material for integration of fuorine-containing low-k dielectrics

Inventors: Alfred Grill, Christopher V. Jahnes, Vishnubhai V. Patel, Katherine L. Saenger
Patented Case View Patent ↗
Granted: Jul 24, 2001 Filed: Aug 11, 1998
Inventors
Alfred Grill
Christopher V. Jahnes
Vishnubhai V. Patel
Katherine L. Saenger
Assignee (at issue)
International Business Machines Corporation

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,265,779
App. No.
09/132,608
Filed
1998-08-11
Granted
2001-07-24
Kind
A