Granted Patent
Utility
US 6,271,561 · App. 09/536,928
Method for fabricating floating gate semiconductor devices with trench isolation structures and self aligned floating gates
Inventor:
Trung T. Doan
Patented Case
View Patent ↗
Granted: Aug 7, 2001
Filed: Mar 27, 2000
Inventor
Trung T. Doan
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.