Granted Patent
Utility
US 6,284,312 · App. 09/507,711
Method and apparatus for chemical vapor deposition of polysilicon
Inventors:
Mohan Chandra, Ijaz Jafri, Kedar P. Gupta, Vishwanath Prasad, Jonathan A. Talbott
Patented Case
View Patent ↗
Granted: Sep 4, 2001
Filed: Feb 18, 2000
Inventors
Mohan Chandra
Ijaz Jafri
Kedar P. Gupta
Vishwanath Prasad
Jonathan A. Talbott
Assignee (at issue)
GT Equipment Technologies, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.