Granted Patent
Utility
US 6,284,633 · App. 08/976,469
Method for forming a tensile plasma enhanced nitride capping layer over a gate electrode
Inventors:
Rajan Nagabushnam, Stanley M. Filipiak, Bruce Boeck
Patented Case
View Patent ↗
Granted: Sep 4, 2001
Filed: Nov 24, 1997
Inventors
Rajan Nagabushnam
Stanley M. Filipiak
Bruce Boeck
Assignee (at issue)
Motorola, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.