Granted Patent
Utility
US 6,287,951 · App. 09/206,715
Process for forming a combination hardmask and antireflective layer
Inventors:
Kevin Lucas, Christopher D. Pettinato, Wayne Clark, Stanley M. Filipiak, Yeong-Jyh T. Lii
Patented Case
View Patent ↗
Granted: Sep 11, 2001
Filed: Dec 7, 1998
Inventors
Kevin Lucas
Christopher D. Pettinato
Wayne Clark
Stanley M. Filipiak
Yeong-Jyh T. Lii
Assignee (at issue)
Motorola, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.