Granted Patent
Utility
US 6,287,980 · App. 09/415,910
Plasma processing method and plasma processing apparatus
Inventors:
Minoru Hanazaki, Takayuki Ikushima, Kenji Shirakawa, Shinji Yamaguchi, Masakazu Taki
Patented Case
View Patent ↗
Granted: Sep 11, 2001
Filed: Oct 12, 1999
Inventors
Minoru Hanazaki
Takayuki Ikushima
Kenji Shirakawa
Shinji Yamaguchi
Masakazu Taki
Assignees (at issue)
MITSUBISHI ELECTRIC CORPORATION
MITSUBISHI ELECTRIC ENGINEERING COMPANY, LIMITED
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.