IP Library Granted Patent US 6,299,659
Granted Patent Utility
US 6,299,659 · App. 09/564,205

Polishing material composition and polishing method for polishing LSI devices

Inventors: Takanori Kido, Fumio Tsujino, Kagetaka Ichikawa, Nobuo Uotani
Patented Case View Patent ↗
Granted: Oct 9, 2001 Filed: May 4, 2000
Inventors
Takanori Kido
Fumio Tsujino
Kagetaka Ichikawa
Nobuo Uotani
Assignee (at issue)
Showa Denko K.K.

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Quick Facts
Patent No.
US 6,299,659
App. No.
09/564,205
Filed
2000-05-04
Granted
2001-10-09
Kind
A