Granted Patent
Utility
US 6,300,185 · App. 09/345,344
Polyacrystalline silicon film formation method
Inventor:
Taishi Kubota
Patented Case
View Patent ↗
Granted: Oct 9, 2001
Filed: Jul 1, 1999
Inventor
Taishi Kubota
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.