Granted Patent
Utility
US 6,300,672 · App. 09/120,630
Silicon oxynitride cap for fluorinated silicate glass film in intermetal dielectric semiconductor fabrication
Inventor:
Gill Yong Lee
Patented Case
View Patent ↗
Granted: Oct 9, 2001
Filed: Jul 22, 1998
Inventor
Gill Yong Lee
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.