Granted Patent
Utility
US 6,306,707 · App. 09/716,659
Double layer hard mask process to improve oxide quality for non-volatile flash memory products
Inventors:
John Foster, Yue-Song He, Jiahua Huang
Patented Case
View Patent ↗
Granted: Oct 23, 2001
Filed: Nov 20, 2000
Inventors
John Foster
Yue-Song He
Jiahua Huang
Assignee (at issue)
ADANCED MICRO DEVICES, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.