Granted Patent
Utility
US 6,306,713 · App. 09/799,469
Method for forming self-aligned contacts and local interconnects for salicided gates using a secondary spacer
Inventors:
YongZhong Hu, Fei Wang, Wenge Yang, Yu Sun, Hiroyuki Kinoshita
Patented Case
View Patent ↗
Granted: Oct 23, 2001
Filed: Mar 5, 2001
Inventors
YongZhong Hu
Fei Wang
Wenge Yang
Yu Sun
Hiroyuki Kinoshita
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.