IP Library Granted Patent US 6,310,684
Granted Patent Utility
US 6,310,684 · App. 09/552,306

Method of measuring spherical aberration in projection system

Inventor: Seiji Matsuura
Patented Case View Patent ↗
Granted: Oct 30, 2001 Filed: Apr 19, 2000
Inventor
Seiji Matsuura
Assignee (at issue)
NEC CORPORATION

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Quick Facts
Patent No.
US 6,310,684
App. No.
09/552,306
Filed
2000-04-19
Granted
2001-10-30
Kind
A