Granted Patent
Utility
US 6,313,476 · App. 09/459,648
Charged beam lithography system
Inventors:
Mitsuko Shimizu, Takayuki Abe, Hirohito Anze, Susumu Oogi, Takashi Kamikubo, Eiji Murakami, Yoshiaki Hattori, Tomohiro Iijima, Hitoshi Higurashi, Kazuto Matsuki
Patented Case
View Patent ↗
Granted: Nov 6, 2001
Filed: Dec 13, 1999
Inventors
Mitsuko Shimizu
Takayuki Abe
Hirohito Anze
Susumu Oogi
Takashi Kamikubo
Eiji Murakami
Yoshiaki Hattori
Tomohiro Iijima
Hitoshi Higurashi
Kazuto Matsuki
Assignee (at issue)
Kabushiki Kaisha Toshiba
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.