Granted Patent
Utility
US 6,315,874 · App. 09/491,183
Method of depositing thin film of metal oxide by magnetron sputtering apparatus
Inventors:
Takayuki Suzuki, Hitoshi Nishio
Patented Case
View Patent ↗
Granted: Nov 13, 2001
Filed: Jan 25, 2000
Inventors
Takayuki Suzuki
Hitoshi Nishio
Assignee (at issue)
KANEKA CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.