Granted Patent
Utility
US 6,319,655 · App. 09/330,710
Modification of 193 nm sensitive photoresist materials by electron beam exposure
Inventors:
Selmer Wong, Matthew Ross
Patented Case
View Patent ↗
Granted: Nov 20, 2001
Filed: Jun 11, 1999
Inventors
Selmer Wong
Matthew Ross
Assignee (at issue)
Electron Vision Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.