IP Library Granted Patent US 6,320,644
Granted Patent Utility
US 6,320,644 · App. 08/228,889

Reticle alignment system for use in lithography

Inventors: Craig R. Simpson, Marc S. Lucas
Patented Case View Patent ↗
Granted: Nov 20, 2001 Filed: Apr 18, 1994
Inventors
Craig R. Simpson
Marc S. Lucas

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Quick Facts
Patent No.
US 6,320,644
App. No.
08/228,889
Filed
1994-04-18
Granted
2001-11-20
Kind
A