Granted Patent
Utility
US 6,322,756 · App. 09/307,058
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
Inventors:
Jose I. Arno, Mark Holst, Kent Carpenter, Scott Lane
Patented Case
View Patent ↗
Granted: Nov 27, 2001
Filed: May 7, 1999
Inventors
Jose I. Arno
Mark Holst
Kent Carpenter
Scott Lane
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.