Granted Patent
Utility
US 6,338,987 · App. 09/377,440
Method for forming polycrystalline silicon layer and method for fabricating thin film transistor
Inventors:
Jong-Hoon Yi, Sang-Gul Lee, Won-Kyu Park
Patented Case
View Patent ↗
Granted: Jan 15, 2002
Filed: Aug 19, 1999
Inventors
Jong-Hoon Yi
Sang-Gul Lee
Won-Kyu Park
Assignee (at issue)
LG Philips LCD Co., Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.