Granted Patent
Utility
US 6,340,627 · App. 09/597,064
Method of making a doped silicon diffusion barrier region
Inventor:
Pai-Hung Pan
Patented Case
View Patent ↗
Granted: Jan 22, 2002
Filed: Jun 19, 2000
Inventor
Pai-Hung Pan
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.