Granted Patent
Utility
US 6,344,409 · App. 09/523,862
Dummy patterns for aluminum chemical polishing (CMP)
Inventors:
Mark A. Jaso, Rainer Florian Schnabel
Patented Case
View Patent ↗
Granted: Feb 5, 2002
Filed: Mar 14, 2000
Inventors
Mark A. Jaso
Rainer Florian Schnabel
Assignee (at issue)
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.