Granted Patent
Utility
US 6,346,477 · App. 09/757,201
Method of interlayer mediated epitaxy of cobalt silicide from low temperature chemical vapor deposition of cobalt
Inventors:
Alain E. Kaloyeros, Ana R. Londergan, Barry C. Arkles
Patented Case
View Patent ↗
Granted: Feb 12, 2002
Filed: Jan 9, 2001
Inventors
Alain E. Kaloyeros
Ana R. Londergan
Barry C. Arkles
Assignee (at issue)
Research Foundation of SUNY - New York
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.