Granted Patent
Utility
US 6,348,076 · App. 09/472,961
Slurry for mechanical polishing (CMP) of metals and use thereof
Inventors:
Donald F. Canaperi, William J. Cote, Paul M. Feeney, Mahadevaiyer Krishnan, Joyce C. Liu, Michael F. Lofaro, Philip Murphy, Eric J. White
Patented Case
View Patent ↗
Granted: Feb 19, 2002
Filed: Dec 28, 1999
Inventors
Donald F. Canaperi
William J. Cote
Paul M. Feeney
Mahadevaiyer Krishnan
Joyce C. Liu
Michael F. Lofaro
Philip Murphy
Eric J. White
Assignee (at issue)
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.