Granted Patent
Utility
US 6,348,705 · App. 09/469,700
Low temperature process for high density thin film integrated capacitors and amorphously frustrated ferroelectric materials therefor
Inventor:
Bryan C. Hendrix
Patented Case
View Patent ↗
Granted: Feb 19, 2002
Filed: Dec 22, 1999
Inventor
Bryan C. Hendrix
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.