Granted Patent
Utility
US 6,355,183 · App. 09/383,417
Apparatus and method for plasma etching
Inventor:
Mitsuhiro Ohkuni
Patented Case
View Patent ↗
Granted: Mar 12, 2002
Filed: Aug 26, 1999
Inventor
Mitsuhiro Ohkuni
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.