Granted Patent
Utility
US 6,355,579 · App. 09/442,736
Method for forming gate oxide film in semiconductor device
Inventor:
Sa K. Ra
Patented Case
View Patent ↗
Granted: Mar 12, 2002
Filed: Nov 18, 1999
Inventor
Sa K. Ra
Assignee (at issue)
Hyundai Electronics Industries Co. Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.