Granted Patent
Utility
US 6,358,670 · App. 09/473,373
Enhancement of photoresist plasma etch resistance via electron beam surface cure
Inventors:
Selmer Wong, Matthew Ross
Patented Case
View Patent ↗
Granted: Mar 19, 2002
Filed: Dec 28, 1999
Inventors
Selmer Wong
Matthew Ross
Assignee (at issue)
Electron Vision Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.