Granted Patent
Utility
US 6,359,307 · App. 09/493,436
Method for forming self-aligned contacts and interconnection lines using dual damascene techniques
Inventors:
Fei Wang, Hiroyuki Kinoshita, Kashmir Sahota, Yu Sun, Wenge Yang
Patented Case
View Patent ↗
Granted: Mar 19, 2002
Filed: Jan 29, 2000
Inventors
Fei Wang
Hiroyuki Kinoshita
Kashmir Sahota
Yu Sun
Wenge Yang
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.