Granted Patent
Utility
US 6,362,052 · App. 09/627,567
Use of an etch to reduce the thickness and around the edges of a resist mask during the creation of a memory cell
Inventors:
Bharath Rangarajan, Fei Wang, George J. Kluth, Ursula Q. Quinto
Patented Case
View Patent ↗
Granted: Mar 26, 2002
Filed: Jul 28, 2000
Inventors
Bharath Rangarajan
Fei Wang
George J. Kluth
Ursula Q. Quinto
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.