Granted Patent
Utility
US 6,363,296 · App. 09/256,930
System and method for automated defect inspection of photomasks
Inventor:
Steffen Schulze
Patented Case
View Patent ↗
Granted: Mar 26, 2002
Filed: Feb 24, 1999
Inventor
Steffen Schulze
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.