Granted Patent
Utility
US 6,379,869 · App. 09/282,745
Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning
Inventors:
Uwe Schroeder, Gerhard Kunkel, Alois Gutmann, Bruno Spuler
Patented Case
View Patent ↗
Granted: Apr 30, 2002
Filed: Mar 31, 1999
Inventors
Uwe Schroeder
Gerhard Kunkel
Alois Gutmann
Bruno Spuler
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.