Granted Patent
Utility
US 6,380,684 · App. 09/573,253
Plasma generating apparatus and semiconductor manufacturing method
Inventors:
Yunlong Li, Masanobu Sato, Yoshio Tominaga, Noriyoshi Sato, Satoru Iizuka
Patented Case
View Patent ↗
Granted: Apr 30, 2002
Filed: May 18, 2000
Inventors
Yunlong Li
Masanobu Sato
Yoshio Tominaga
Noriyoshi Sato
Satoru Iizuka
Assignee (at issue)
Hitachi Kokusai Electric Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.