Granted Patent
Utility
US 6,406,818 · App. 09/283,087
Method of manufacturing photomasks by plasma etching with resist stripped
Inventors:
Rick Zemen, Tiecheng Zhou
Patented Case
View Patent ↗
Granted: Jun 18, 2002
Filed: Mar 31, 1999
Inventors
Rick Zemen
Tiecheng Zhou
Assignee (at issue)
PHOTRONICS, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.