Granted Patent
Utility
US 6,409,780 · App. 09/482,937
Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices
Inventors:
Hiroyuki Yano, Nobuo Hayasaka, Katsuya Okumura, Akira Iio, Masayuki Hattori, Kiyonobu Kubota
Patented Case
View Patent ↗
Granted: Jun 25, 2002
Filed: Jan 14, 2000
Inventors
Hiroyuki Yano
Nobuo Hayasaka
Katsuya Okumura
Akira Iio
Masayuki Hattori
Kiyonobu Kubota
Assignees (at issue)
Kabushiki Kaisha Toshiba
JSR CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.