Granted Patent
Utility
US 6,410,448 · App. 09/384,858
Plasma etch reactor and method for emerging films
Inventors:
Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail
Patented Case
View Patent ↗
Granted: Jun 25, 2002
Filed: Aug 27, 1999
Inventors
Stephen P. DeOrnellas
Alferd Cofer
Robert C. Vail
Assignee (at issue)
TEGAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.