IP Library Granted Patent US 6,413,793
Granted Patent Utility
US 6,413,793 · App. 09/858,469

Method of forming protrusions on single crystal silicon structures built on silicon-on-insulator wafers

Inventors: Chuang-Chia Lin, Peter M. Gulvin, Alex T. Tran, Nena Liakopoulos
Patented Case View Patent ↗
Granted: Jul 2, 2002 Filed: May 17, 2001
Inventors
Chuang-Chia Lin
Peter M. Gulvin
Alex T. Tran
Nena Liakopoulos
Assignee (at issue)
Xerox Corporation

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Quick Facts
Patent No.
US 6,413,793
App. No.
09/858,469
Filed
2001-05-17
Granted
2002-07-02
Kind
B1