Granted Patent
Utility
US 6,413,822 · App. 09/296,959
Super-self-aligned fabrication process of trench-gate DMOS with overlying device layer
Inventors:
Richard K. Williams, Wayne B. Grabowski
Patented Case
View Patent ↗
Granted: Jul 2, 2002
Filed: Apr 22, 1999
Inventors
Richard K. Williams
Wayne B. Grabowski
Assignee (at issue)
ADVANCED ANALOGIC TECHNOLOGIES INCORPORATED
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.