Granted Patent
Utility
US 6,416,907 · App. 09/559,262
Method for designing photolithographic reticle layout, reticle, and photolithographic process
Inventors:
Amy A. Winder, Werner Juengling
Patented Case
View Patent ↗
Granted: Jul 9, 2002
Filed: Apr 27, 2000
Inventors
Amy A. Winder
Werner Juengling
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.